Huawei has released a new patent to improve the company’s chip development. The latest patent application shows the use of EUV lithography technology to improve the manufacture of integrated circuits and chipsets.
For your information, EUV (Extreme UltraViolet) lithography is an optical technology used to manufacture chipsets and circuits for electronic devices. It is a preferable technology for processors with 7 nm or less processing structures.
Moreover, lithography mainly performs the transfer, processing and creation of micro-nano graphics. It also checks the total number of elements equipped in a chipset and verifies the proper size and other details in the circuitry.
After noting these advantages, Huawei decided to obtain the corresponding technology patent to improve its chip development. According to the latest entries, this mechanism will use a reflector, a lithography system and command management.
In addition, the lithography system will include the following components:
- A specialized mirror (Decoherent Mirror)
- Lighting system (lighting)
- Reflecting mirror or rotating mirror
Here, the lighting system plays a vital role in the whole mechanism. It provides highly uniform light, controls exposure, and determines off-axis lighting effects to optimize the level of resolution and increase depth of focus.
In addition, this system includes a wide-field compound lens, a large-diaphragm lens, and a relay lens.
How will lithography technology work?
To begin with, a coherent source with a rotating mirror will emit light onto the lighting system. This system will split the emitted light into multiple sub-rays using the wide field of view compound lens.
After dividing, the diaphragm lens and the relay lens will adjust the direction and radiation of each sub-ray and project it onto the mask area to perform lithography.
Together this process will form an interference pattern that will continue to change with new light rays. Therefore, it will even out the light exposure and solve the non-uniform light issues that often occur during chip development.
In addition to uniform light rays, this mechanism will facilitate the creation and formation of nanoparticles that assemble into integrated circuits or micro-chipsets.
(Source)
